Evers, E., van de Wal, M. M. J., & Oomen, T. A. E.
20th World Congress of the International Federation of Automatic Control, Toulouse, France
Manufacturing equipment often consists of multiple subsystems. For instance, in lithographic IC manufacturing, both a reticle stage and a wafer stage move synchronously. Traditionally, these subsystems are divided into manageable subproblems, at the expense of a suboptimal overall solution. The aim of this paper is to develop a framework for overall system performance improvement. The method pursued in this paper builds on traditional designs, and extends these through a bi-directional controller coupling. The aim here is to optimize a criterion that specifies overall system performance. To achieve this, a new parameterization that relates to the Youla parameterization is developed that connects the bi-directional controller parameter affinely to the overall control criterion, which enables a systematic design. The performance improvement is confirmed in a case study using measured data from an industrial wafer scanner.
Available online at: https://doi.org/10.1016/j.ifacol.2017.08.2382